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SPIE Advanced Lithography
February 26, 2013 8:00 am
February 27, 2013 5:00 pm
January 21, 2013

Exhibit at Advanced Lithography 2013

For 36 years SPIE Advanced Lithography has been the premier international event that drives the future of lithography research and applications. Exhibit at the largest gathering of lithography experts in the world. Reach pre-qualified buyers, establish relationships with vendors and suppliers, and see the industry’s future.

Many of the industry’s top semiconductor suppliers, integrators, and manufacturers take part in the annual SPIE Advanced Lithography exhibition. Come to the 2013 Exhibition, scheduled for 26-27 February, meet the leaders in the field, and see the latest in lithography and related technologies.

Featured technologies:

• Etch Technology for nanopatterning

• Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET

• Metrology, inspection, OPC, and process control

• Design and manufacturing software

• Materials and chemicals

• Imaging equipment

• Lasers

• Resist materials and processing

• Nano-imprint

• IC and chip fabrication

• Nanoscale imaging


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